Why do they not "stick" ?


Just came across another "suggested alternate to ArFi" litho - http://www.nanowerk.com/nanotechnology_articles/newsid=47727.php - "self-collapse litho"

In fact the article itself lists various other "molecular patterning strategies" that are/were tried - soft lithographic microcontact printing (µCP), replica molding, nanoimprint lithography, polymer pen lithography, nanotransfer printing, decal transfer printing, and nanoskiving.

Add to it the "multi ebeams" and DSAs and then those fancy named ones - SCALPEL:Scattering with angular limitation projection electron beam lithography ; PREVAIL: Projection Reduction Exposure with Variable Axis Immersion Lenses ; LEEPL: Low Energy Ebeam Projection Litho ..      


Nothing "stuck" -pun intended - on the wafer ! Closest seems to be EUV, but thats yet again changing the source for a mask-based litho.. indeed in this case the change to a reflective system is a big one

Considering that it is perhaps close to two decades of exploring these alternate techniques, what is it that resulted in nothing else clicking ? Inertia ? less-time to catch up on nodes and no dont-wanna-take-risk attitude of competitors ? Or just that noone has been able to come up with a path-breaker yet ?
 



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